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液晶面板制造流程包括:ITO 玻璃的投入(grading)--玻璃清洗与干燥(CLEANING)--涂光刻胶(PRCOA T)--前烘烤(PREBREAK)--曝光(DEVELOP)显影(MAIN CURE)--蚀刻 (ETCHING)--去膜(STRIP CLEAN)--图检(INSP)--清洗干燥(CLEAN)--TOP涂
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液晶面板制造流程包括:ITO 玻璃的投入(grading)--玻璃清洗与干燥(CLEANING)--涂光刻胶(PRCOA T)--前烘烤(PREBREAK)--曝光(DEVELOP)显影(MAIN CURE)--蚀刻 (ETCHING)--去膜(STRIP CLEAN)--图检(INSP)--清洗干燥
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多晶硅超纯水设备主要用在多晶硅片清洗中,多晶硅片、半导体元器件生产中硅片须经过严格清洗,微量污染也会导致器件失效。清洗的目的在于清除表面污染杂质,包括有机物和无机物。这些杂质有的以原子状态或离子状态,有的以薄膜形式或颗粒形式存在于硅片表面。有...
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